一种新型脉冲微束斑X射线源的研究

Study of Protable Pulse X-ray Sources with Micro-beam

摘要:

通过控制栅极电压技术，有效地控制LaB6阴极电子枪发射系统电子束发射的通与断，成功实现了新型台式微束斑X射线源的脉冲辐射。该X射线源主要由三部分组成：LaB6单晶阴极电子枪发射系统，静电聚焦系统以及金属靶材系统。通过对该微束斑X射线源输出的X射线束斑、亮度等特性的初步实验测试，表明这种脉冲式微束斑X射线源具有束斑小、亮度高的特点，其中X射线束焦斑仅为10μm左右。

Abstract:

A noval protable pulse X-ray source with micro-beam was introduced in this paper.The pulse X-ray source is composed of three portions:LaB_6 crystal cathode electron gun emitting system,electrostatic focusing system,and metal target system.The LaB_6 crystal cathode electron gun emitting electron beam are controlled by modulating Wehnelt grid voltage,and the X-ray is irradiated by high energy electron beam bombarding the metal target.In addition,the capabilities of the new X-ray source with micro-beam such as the electro-beam focus and luminance were preliminary tested,the minimal focal point dimension is just about 10 micrometre.