激光预处理对HfO2光学薄膜微观性能的影响

Influence mechanism of laser conditioning on the microcosmic properties of HfO 2optical thin films

摘要:

研究了在1-on-1方式下激光预处理对HfO₂光学薄膜微观形貌、微观结构等性能的影响。实验采用薄 膜阈值能量的10%、50%%对HfO₂薄膜进行激光预处理,利用原子力显微镜(AFM )分别对预处理后薄膜表面 10μm和3μm×3μm的区域进行测 试,与预处理前相比,预处理后的薄膜所含杂质减少,薄膜表面锥状结构变得平 滑；利用X射线衍射(XRD)和X射线光电子能谱(XPS)分别对预处理后薄膜的晶态结 构和化学键以及价态进 行测试,与预处理前相比,预处理后薄膜的晶态结构、化学键及价态均没有发生变化；利用 XPS对预处理后薄膜所含 的成分进行测试,与预处理前相比,预处理后薄膜中所含的Hf单质减少,HfO₂增多。实验 结果表明,激光预处理具有抛光和氧化膜层的作用。

Abstract:

In 1-on-1case the influence of laser conditioning on the microscopic morpholo gy and structure of HfO_2optical thin film is studied.The HfO_2thin films we re irradiated with 10%,30%, 50% and 70% of the threshold energy in 1-on-1.In order to research the micros copic morphology of HfO_2optical thin film,the film surface areas of 10μm×10μm and 3μm×3μm we re tested with atomic force microscope. Comparing laser conditioning with non-laser conditioning,the thin film being ir radiated contains less impurities and its cone-shaped structure becomes smooth.The microscopic struct ure of thin film was tested with X-ray diffraction and X-ray photoelectron spectroscopy.Comparing laser co nditioning with non-laser conditioning,the crystalline structure,the chemical bond and the element valen ce of thin film being irradiated are not changed.The components of thin film were tested with X-ray p hotoelectron spectroscopy. Comparing laser conditioning with non-laser conditioning,the thin film being ir radiated contains less hafnium and more oxides of hafnium.The experimental results show that the laser conditioning plays an important role in polishing and oxidizing HfO_2thin fil m.